Conte aos seus amigos sobre este item:
Flux Profile Modeling Using Monte Carlo Simulation: a Simulation Tool for Deposition Processess Using Molecular Beam Epitaxy Rama Venkat
Item sob encomenda (no estoque do fornecedor)
Presentes de Natal podem ser trocados até 31 de janeiro
O que dizem nossos clientes:
Flux Profile Modeling Using Monte Carlo Simulation: a Simulation Tool for Deposition Processess Using Molecular Beam Epitaxy
Rama Venkat
Molecular Beam Epitaxy (MBE) is a process by which semiconductor films are grown on the substrate by physical vapor deposition of the source material in an ultra high vacuum environment. Spatial variations in flux are a result of the shape of the crucible and the geometry of the growth chamber. A process simulation tool for MBE based on a phenomenological model is proposed and elaborated. The tool can be used in industry to simulate the effusion and deposition of molecular beams by taking into account different parameters that influence the process. Additionally, it can generate deposition profiles created by effusing flux species, on the platen containing the wafers.
| Mídia | Livros Paperback Book (Livro de capa flexível e brochura) |
| Lançado | 14 de junho de 2010 |
| ISBN13 | 9783838369389 |
| Editoras | LAP LAMBERT Academic Publishing |
| Páginas | 104 |
| Dimensões | 225 × 6 × 150 mm · 173 g |
| Idioma | Alemão |
