High-k Materials in Dynamic Random Access Memories (Dram): Atomic Scale Engineering of Hfo2-based Dielectrics for Future Dram Applications - Piotr Dudek - Livros - Südwestdeutscher Verlag für Hochschulsch - 9783838130187 - 23 de dezembro de 2011
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High-k Materials in Dynamic Random Access Memories (Dram): Atomic Scale Engineering of Hfo2-based Dielectrics for Future Dram Applications

Piotr Dudek

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High-k Materials in Dynamic Random Access Memories (Dram): Atomic Scale Engineering of Hfo2-based Dielectrics for Future Dram Applications

I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.

Mídia Livros     Paperback Book   (Livro de capa flexível e brochura)
Lançado 23 de dezembro de 2011
ISBN13 9783838130187
Editoras Südwestdeutscher Verlag für Hochschulsch
Páginas 112
Dimensões 150 × 7 × 226 mm   ·   176 g
Idioma English  

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