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Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices
Young-Hee Kim
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices
Young-Hee Kim
Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).
92 pages, X, 92 p.
Mídia | Livros Paperback Book (Livro de capa flexível e brochura) |
Lançado | 31 de dezembro de 2007 |
ISBN13 | 9783031014246 |
Editoras | Springer International Publishing AG |
Páginas | 92 |
Dimensões | 212 g |
Idioma | English |