Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices - Young-Hee Kim - Livros - Springer International Publishing AG - 9783031014246 - 31 de dezembro de 2007

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Young-Hee Kim
Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices Young-Hee Kim

Name: Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices
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Author: Young-Hee Kim

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Hf-Based High-k Dielectrics: Process Development, Performance Characterization, and Reliability - Synthesis Lectures on Solid State Materials and Devices

Young-Hee Kim

Hard breakdown and soft breakdown, particularly the Weibull slopes, were studied under constant voltage stress. The origin of soft breakdown (first breakdown) was studied and the results suggested that the soft breakdown may be due to one layer breakdown in the bilayer structure (HfO2/SiO2: 4 nm/4 nm).

92 pages, X, 92 p.

Mídia	Livros Paperback Book (Livro de capa flexível e brochura)
Lançado	31 de dezembro de 2007
ISBN13	9783031014246
Editoras	Springer International Publishing AG
Páginas	92
Dimensões	150 × 220 × 10 mm · 212 g
Idioma	Inglês